Production of designs on nonmetallic heat-resisting bases



Patented Sept. 20, 1949 mo ents;

.Erank zE-nochmKerr-idge, mention;-eEnglamLsias 'i' Q m signor to Johnson; Matthey & Company Limsisflehendoms in and aIir hh compan 1 No Drawing. ,Application sia- 9; 1945,

7 Claims.

invention relates to the v designs on non-metallic heat-resisting bases, such as glass,- fused silica, micafporcelain, china and ceramics.

. According to this invention I- produce designs onrnon-metallic heat-resisti g bases .by-a;v process coated base to burn away organic material and causethe metal oxides contained intheliquid gresist-andiei'firing'toburn aivayithe resis; i

1 iLiquid lus'tres are solutions of resina es 'of base metals, such as iron, tjitanium, bismuth, tin, zinc and the1ike,-=with or---without additions of sulphogresinates of gold and-{or other precious e a s-w i rsanio s v nts esnch as azesse l oils, aromatic alcohols, ethers, ketones, light mineral oils, volatile hydrocarbons and chlorinated hydrocarbons. Compounds of non-metallic elements, such as silicon and boron, may be incorporated to modify the colour and improve the adhesion of the metal oxides.

The colour of the film of metallicoxides comprising the fired liquid lustre may be varied by choice of the liquid lustre or by mixing two or more liquid lustres or also by varying the percentage of gold lustre in the mixture so as to produce a dispersion of finely divided gold in the metallic oxide film. The intensity of the colour may be varied by increasing or decreasing the dilution of the liquid lustres.

The film of liquid lustre may beapplied by spraying but I prefer to applyit by a spinning operaton consisting in placing the desired amountof liquid lustre on the base and then rotating the base so that the liquid is spread e e y over he surface and any excess is thrown ofi by centrifugal force.

The firing may be carried out at temperatures within the range 400 to 800 0., depending on the material of which the base is composed. It should be continued until all organic matter has been burned away and the film of metallic oxides adheres firmly to the base.

The photographic resist may be produced as follows: I

The coated base is covered with a film of glue or gelatin which has been rendered sensitive to light by the addition of a soluble chromate or bichromate. A wetting agent may be added to assist in even distribution of the glue over the base. The glue or gelatin film is then exposed (en age-if ;5 water an -th;e re ainde (toni htthrcu hagebotos i nhic: nes tit when wby a l-insoluble positive image; of the design i roducedrna sci th film w mhat lQ z -flined isolu le are w.a h d awa th 209M ied a idl h :r es i mase-i :t .-a: Whea :ex mn sio s fle e e ati ro 2 .1t 13. or J ys-treatm n w t -chemi al; rea ents, uchlasy tmaldehyde:on-c m v.Thematch n -bfstepa(121) carried u wi h a reagent which does not attack the resistorfthe i-und rl na meia licreside 1m. is'uiia t .ibntyl nd a y ea ee ols- 1nq htd x ca cobol .uchqasecthylenecglyc l-edi th le g lycql; ad a .;yQ@rQ ,.,-"Q ;i ste ;;r ier bth la -:bci1.ine'ses er.s: chaset-h a bu rllactait.

samyllactateandlthe lyco and;;al .c.e c1-.a eta s)- The following are examples of etching baths, the parts'being by weight:

Parts (1) ethyl alcohol 100 a potassium iodide 4 iodine -Q 2 (2) ethylene glycol monoacetate 100 acetic acid 10 bromine 2 (3) ethyl lactate 10o lactic acid 10 bromine 2 The solutions containing bromine act more rapidly than those containing iodine.

The etching action may be accelerated by suspending in the etching solutions a solid, such as fine sawdust or levigated alumina, which exerts a mild scouring action on the'metallic oxide film M) when the base is gently agitated.

I claim 1. A process of producing designs on nonmetallic heat-resisting bases comprising the steps of: (a) providing a non-metallic base with a thin 45 film of a composition consisting of a solution of a resinate of at least one base metal, (1)) firing the coated base to burn away organic material and leave a firmly adherent film of metal oxide'on said base, (c) coating the resulting surface with a film 50 Of a light-sensitized colloid selected from the group consisting of glue and gelatine and processing said film by photographic methods to produce a positive image in said colloid of the desired design, (d) hardening said image to convert it 5 into a resist, (e) etching away the coating not non-aqueous solvent used in step (e) is amyl lactate. V

3. A process as claimed in claim 1, in which the etching solution also contains a suspended solid.

4. A process of producing designs on non-- metallic heat-resisting bases comprising the steps of: (a) providing a non-metallic base with a thin film of a composition consisting of a solution of a T resinate of at least one base metal, (b) firing the coated base to burn away organic material and leave a firmly adherent film of metal oxide on said base, (0) coating the resulting s iirface'with a film of a light-sensitised colloid selected from the group consisting of glue and gelatine and processing said film by photographic'inethodsto produce a positive image in said colloid ofthe desired design, (11) hardening said image to convert it into a resist, (e) etching away the coating not covered by theresist with a solution of bromine in amyl lactate, thus leaving the metal oxide design below the resist and (f) firing the coated base to burn away the resist.

5. A process of producing designs on nonmetallic heat-resisting bases comprising the steps of: (a) providing a non-metallic base with a thin film of a composition consisting o f;a s olution of at resinate of at least onebase metal," (17) firing the coated base to-burnaway organic'material' and leave a firmly adherent film of 7 metal oxide on said base, (0) coating the resulting fsuriacewith a film of a light-sensitised colloid selectedfrom 'the "lactate.

group consisting of glue and gelatine and processing said film by photographic methods to produce a positive image in said colloid of the desired design, ((1) hardening said image to convert it into a resist, (e) etching away the coating not covered by the resist with a solution of bromine in amyl lactate, thus leaving the metal oxide design below the resist and (f) firing the coated base at a temperature of from 400 C. to 800 C. to burn away the resist.

6. A process as claimed in claim 1 in which the nomaqueous solvent used in step (e) is ethyl lactate. V

7.-A process as claimed in claim 1 in which the non-aqueous solvent used in step (e) is butyl FRANK ENOCH KERRIDGE.

REFERENCES CITED The following references are of record in the file of this patent:

, UNITED STATES PATENTS Number 

